Future Challenges for Cleaning in Advanced Microelectronics |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
1-6 |
| DOI |
10.4028/www.scientific.net/SSP.92.1 |
| Authors |
Allen Bowling,
Brian K. Kirkpatrick,
Trace Hurd,
Laura Losey,
Phil Matz
|
| Keywords |
Clustered Cleaning, New Materials Cross-Contamination Control, Porous-Low-K Cleaning, Silicon Wafer Cleaning, Single Wafer Cleaning, Surface Preparation |
| Full Paper |
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