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Wet Etch Enhancement of HfO2 Films by Implant Processing

Journal Solid State Phenomena (Volume 92)
Volume Ultra Clean Processing of Silicon Surfaces VI
Edited by Marc Heyns, Paul Mertens and Marc Meuris
Pages 11-14
DOI 10.4028/www.scientific.net/SSP.92.11
Authors Joel Barnett, Deborah J. Riley, Troy C. Messina, Pat Lysaght, Ron Carpio
Keywords High-k, Wet Etch
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