Selective Wet Etching of High-k Gate Dielectrics |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
129-131 |
| DOI |
10.4028/www.scientific.net/SSP.92.129 |
| Citation |
Kurt K. Christenson et al., 2003, Solid State Phenomena, 92, 129 |
| Authors |
Kurt K. Christenson, Brent Schwab, Thomas J. Wagener, Bruce Rosengren, Deborah J. Riley, Joel Barnett |
| Keywords |
Etch, HfO2, High-k, Silicate, Zro2 |
| Full Paper |
Get the full paper by clicking here
|
