Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
143-146 |
| DOI |
10.4028/www.scientific.net/SSP.92.143 |
| Citation |
Guy Vereecke et al., 2003, Solid State Phenomena, 92, 143 |
| Authors |
Guy Vereecke, Rita Vos, Marc M. Heyns, M. Schmidt, Frank Holsteyns, M. Baeyens, S. Gomme, James Snow, Paul W. Mertens, V. Coenen, T. Bauer |
| Keywords |
APM, Megasonics, Particle Removal, Wet Cleaning |
| Full Paper |
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