Paper Title:
Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
157-160
DOI
10.4028/www.scientific.net/SSP.92.157
Citation
A. Eitoku, R. Vos, J. Snow, M. Sato, S. Hirae, K. Nakajima, M. Nonomura , M. Imai, P. W. Mertens, M. M. Heyns, "Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool", Solid State Phenomena, Vol. 92, pp. 157-160, 2003
Online since
May 2003
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