Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
157-160 |
| DOI |
10.4028/www.scientific.net/SSP.92.157 |
| Citation |
Atsuro Eitoku et al., 2003, Solid State Phenomena, 92, 157 |
| Authors |
Atsuro Eitoku, Rita Vos, James Snow, M. Sato, S. Hirae, Kazuo Nakajima, M. Nonomura, M. Imai, Paul W. Mertens, Marc M. Heyns |
| Keywords |
Cleaning, Metal Contamination, Oxide Loss, Particle Removal, Single Wafer |
| Full Paper |
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