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Introduction of High-k Materials into Wet Processing, Analysis and Behavior

Journal Solid State Phenomena (Volume 92)
Volume Ultra Clean Processing of Silicon Surfaces VI
Edited by Marc Heyns, Paul Mertens and Marc Meuris
Pages 19-22
DOI 10.4028/www.scientific.net/SSP.92.19
Citation Bart Onsia et al., 2003, Solid State Phenomena, 92, 19
Authors Bart Onsia, David Hellin, M. Claes, A. Maes, Stefan De Gendt, Marc M. Heyns
Keywords High-k Analysis, High-k Cleaning, High-k Contamination
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