Paper Title:
Defect-Free Si Thinning by In Situ HCI Vapour Etching
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
199-202
DOI
10.4028/www.scientific.net/SSP.92.199
Citation
R. Loo, M. Caymax, O. Richard, P. Verheyen, N. Collaert, "Defect-Free Si Thinning by In Situ HCI Vapour Etching", Solid State Phenomena, Vol. 92, pp. 199-202, 2003
Online since
May 2003
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Price
$32.00
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