Defect-Free Si Thinning by In Situ HCI Vapour Etching |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
199-202 |
| DOI |
10.4028/www.scientific.net/SSP.92.199 |
| Citation |
R. Loo et al., 2003, Solid State Phenomena, 92, 199 |
| Authors |
R. Loo, Matty Caymax, Olivier Richard, Peter Verheyen, Nadine Collaert |
| Keywords |
Epitaxial Growth, In Situ Vapour HCI Etch, Si Thinning |
| Full Paper |
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