Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
203-206 |
| DOI |
10.4028/www.scientific.net/SSP.92.203 |
| Citation |
Ron Hanestad et al., 2003, Solid State Phenomena, 92, 203 |
| Authors |
Ron Hanestad, Brent Schwab, Jeffery W. Butterbaugh, Kun Tack Lee, Woo Gwan Shim, Sang Yong Kim, Yong Pil Han |
| Keywords |
Anhydrous HF, Capacitor, DRAM |
| Full Paper |
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