Paper Title:
Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
207-210
DOI
10.4028/www.scientific.net/SSP.92.207
Citation
G. Montaño-Miranda, A. Muscat, "Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films", Solid State Phenomena, Vol. 92, pp. 207-210, 2003
Online since
May 2003
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Price
$32.00
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