Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films |
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| Journal | Solid State Phenomena (Volume 92) |
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| Volume | Ultra Clean Processing of Silicon Surfaces VI |
| Edited by | Marc Heyns, Paul Mertens and Marc Meuris |
| Pages | 207-210 |
| DOI | 10.4028/www.scientific.net/SSP.92.207 |
| Citation | Gerardo Montaño-Miranda et al., 2003, Solid State Phenomena, 92, 207 |
| Authors | Gerardo Montaño-Miranda, Anthony Muscat |
| Keywords | Dry Clean, FTIR, HF/Vapour Etching, Silicon Dioxide |
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