Paper Title:
Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process
  Abstract

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Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
227-230
DOI
10.4028/www.scientific.net/SSP.92.227
Citation
G. W. Gale, T. Toshima, N. Shindo, T. Iino, S. Kitahara, K. Taguchi, "Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process", Solid State Phenomena, Vol. 92, pp. 227-230, 2003
Online since
May 2003
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