Novel Photoresist Removal Using Atomic Hydrogen Generated by Heated Catalyzer
| Periodical | Solid State Phenomena (Volume 92) |
|---|---|
| Main Theme | Ultra Clean Processing of Silicon Surfaces VI |
| Edited by | Marc Heyns, Paul Mertens and Marc Meuris |
| Pages | 231-234 |
| DOI | 10.4028/www.scientific.net/SSP.92.231 |
| Citation | T. Miki et al., 2003, Solid State Phenomena, 92, 231 |
| Authors | T. Miki, Akira Izumi, H. Matsumura |
| Keywords | Atomic Hydrogen, Heated Catalyzer, Photoresist Removal |
| Price | US$ 28,- |