'Resist / Wet Etch' Couple for Dual Gate Oxide |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
235-238 |
| DOI |
10.4028/www.scientific.net/SSP.92.235 |
| Citation |
Alessio Beverina et al., 2003, Solid State Phenomena, 92, 235 |
| Authors |
Alessio Beverina, I. Guilmeau, J.P. Carrere, N. Emonet, F. Guyader, V. Huard, Sébastien Petitdidier, R. Velard |
| Keywords |
BOE, Etching, HF, Resist |
| Full Paper |
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