Paper Title:
Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
243-246
DOI
10.4028/www.scientific.net/SSP.92.243
Citation
S. Y.M. Chooi, C. Lim, W. J. Liu, P.-Y. Ee, "Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study", Solid State Phenomena, Vol. 92, pp. 243-246, 2003
Online since
May 2003
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.