Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
243-246 |
| DOI |
10.4028/www.scientific.net/SSP.92.243 |
| Citation |
Simon Y.M. Chooi et al., 2003, Solid State Phenomena, 92, 243 |
| Authors |
Simon Y.M. Chooi, Christopher Lim, Wen Jun Liu, Ping-Yu Ee |
| Keywords |
Silicide, SPM, X-Ray Photoelectron Spectroscopy (XPS) |
| Full Paper |
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