Paper Title:
Alternative Post-Etch Polymer Removal in a Single-Wafer Platform
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
247-250
DOI
10.4028/www.scientific.net/SSP.92.247
Citation
C. Dundas, R. Vroom, J. Ghekiere, P. Van Doorne, I. Rink, I. Sharp, S. Heffernan, "Alternative Post-Etch Polymer Removal in a Single-Wafer Platform", Solid State Phenomena, Vol. 92, pp. 247-250, 2003
Online since
May 2003
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Price
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