Paper Title:
Post Metal Etch Polymer Removal: A New CF4-Based Dry Plasma Process Sequence
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
255-258
DOI
10.4028/www.scientific.net/SSP.92.255
Citation
M. P. Pozzoli, S. Petroni, "Post Metal Etch Polymer Removal: A New CF4-Based Dry Plasma Process Sequence", Solid State Phenomena, Vol. 92, pp. 255-258, 2003
Online since
May 2003
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Price
$32.00
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