Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
27-32 |
| DOI |
10.4028/www.scientific.net/SSP.92.27 |
| Authors |
Rita Vos,
Marcel Lux,
Sophia Arnauts,
Karine Kenis,
M. Maes,
Bart Onsia,
James Snow,
Frank Holsteyns,
Guy Vereecke,
Paul W. Mertens,
Marc M. Heyns,
O. Doll,
A. Fester,
Bernd O. Kolbesen,
T. Hackett,
Mark Hoffman
|
| Keywords |
APM, Complexing Agent, Metal Removal, SC1, Single Chemistry Clean |
| Full Paper |
Get the full paper by clicking here
|
