Paper Title:
Corrosion Inhibaitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning
  Abstract

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Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
271-274
DOI
10.4028/www.scientific.net/SSP.92.271
Citation
S. Tamilmani, W. Huang, S. Raghavan, R. Small, "Corrosion Inhibaitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning", Solid State Phenomena, Vol. 92, pp. 271-274, 2003
Online since
May 2003
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