Removal of Heavy Organics by Supercritical CO2 |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
301-0 |
| DOI |
10.4028/www.scientific.net/SSP.92.301 |
| Citation |
Akshey Sehgal et al., 2003, Solid State Phenomena, 92, 301 |
| Authors |
Akshey Sehgal, M.R. Yalamanchili, C. Millet, Adrien Danel, F. Tardif |
| Keywords |
Post-Etch Cleaning, Resist Stripping, Supercritical Co2 Cleaning |
| Full Paper |
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