Single Wafer Immersion Process Incorporating a Novel Megasonics Configuration with an Advanced IPA Vapor Condensation Dry |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
45-48 |
| DOI |
10.4028/www.scientific.net/SSP.92.45 |
| Citation |
J.J. Rosato et al., 2003, Solid State Phenomena, 92, 45 |
| Authors |
J.J. Rosato, E.G. Baiya, J.A. Imonigie, M.R. Yalamanchili, E. Hansen |
| Keywords |
Etching, Immersion, IPA Vapor Drying, Megasonics, Single Wafer, Surface Preparation, Wafer Cleaning |
| Full Paper |
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