Metallic Contamination Removal Evaluation for Single Wafer Processing |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
49-52 |
| DOI |
10.4028/www.scientific.net/SSP.92.49 |
| Citation |
Pieter Boelen et al., 2003, Solid State Phenomena, 92, 49 |
| Authors |
Pieter Boelen, Steven Verhaverbeke, Philippe Garnier, Didier Levy, Hitoshi Morinaga |
| Keywords |
Chelating Agent, Metallic Contamination, Single Wafer Cleaning |
| Full Paper |
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