Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System |
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| Journal | Solid State Phenomena (Volume 92) |
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| Volume | Ultra Clean Processing of Silicon Surfaces VI |
| Edited by | Marc Heyns, Paul Mertens and Marc Meuris |
| Pages | 57-62 |
| DOI | 10.4028/www.scientific.net/SSP.92.57 |
| Authors | Jennifer Baker, Christopher Beaudry, Hitoshi Morinaga, Steven Verhaverbeke |
| Keywords | Oasis, RCA, SC-1, Single, Surfactant, Wafer |
| Full Paper | 
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