Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
57-62 |
| DOI |
10.4028/www.scientific.net/SSP.92.57 |
| Citation |
Jennifer Baker et al., 2003, Solid State Phenomena, 92, 57 |
| Authors |
Jennifer Baker, Christopher Beaudry, Hitoshi Morinaga, Steven Verhaverbeke |
| Keywords |
Oasis, RCA, SC-1, Single, Surfactant, Wafer |
| Full Paper |
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