Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
7-10 |
| DOI |
10.4028/www.scientific.net/SSP.92.7 |
| Citation |
Martine Claes et al., 2003, Solid State Phenomena, 92, 7 |
| Authors |
Martine Claes, T. Witters, G. Loriaux, S. Van Elshocht, A. Delabie, Stefan De Gendt, Marc M. Heyns, Harald Okorn-Schmidt |
| Keywords |
High-k, Open Circuit Potential, Wet Etching |
| Full Paper |
Get the full paper by clicking here
|
