Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
7-10 |
| DOI |
10.4028/www.scientific.net/SSP.92.7 |
| Authors |
Martine Claes,
T. Witters,
G. Loriaux,
S. Van Elshocht,
A. Delabie,
Stefan De Gendt,
Marc M. Heyns,
Harald Okorn-Schmidt
|
| Keywords |
High-k, Open Circuit Potential, Wet Etching |
| Full Paper |
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