Paper Title:
Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
85-88
DOI
10.4028/www.scientific.net/SSP.92.85
Citation
S. Y.M. Chooi, S.-Y. Loong, C. Lim, Z. Ismail, T.-T. Tjoa, "Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment", Solid State Phenomena, Vol. 92, pp. 85-88, 2003
Online since
May 2003
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.