Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment |
| Journal |
Solid State Phenomena (Volume 92) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VI |
| Edited by |
Marc Heyns, Paul Mertens and Marc Meuris |
| Pages |
85-88 |
| DOI |
10.4028/www.scientific.net/SSP.92.85 |
| Citation |
Simon Y.M. Chooi et al., 2003, Solid State Phenomena, 92, 85 |
| Authors |
Simon Y.M. Chooi, Sang-Yee Loong, Christopher Lim, Zainab Ismail, Tjin-Tjin Tjoa |
| Keywords |
BOE, Dual Gate Oxide, Wet Etching |
| Full Paper |
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