Paper Title:
A Novel Instrumentation for Contamination and Deposition Control on 300 mm Silicon Wafers Employing Synchrotron Radiation Based TXRF and EDXRF Analysis
  Abstract

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Periodical
Solid State Phenomena (Volume 92)
Edited by
Marc Heyns, Paul Mertens and Marc Meuris
Pages
89-92
DOI
10.4028/www.scientific.net/SSP.92.89
Citation
B. Beckhoff, R. Fliegauf, J. Weser, G. Ulm, "A Novel Instrumentation for Contamination and Deposition Control on 300 mm Silicon Wafers Employing Synchrotron Radiation Based TXRF and EDXRF Analysis", Solid State Phenomena, Vol. 92, pp. 89-92, 2003
Online since
May 2003
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