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Polycrystalline Semiconductors VII

Solid State Phenomena Volume 93

• Papers
• Abstracts

• p3 Polycrystalline Silicon Thin-Film Transistors on Flexible Steel Foil Substrates for Complementary-Metal-Oxide-Silicon Technology   [ 921 K ]
  Authors: Ming Wu, James C. Sturm, Sigurd Wagner
• p13 High Temperature Crystallized Poly-Si on Molybdenum Substrates for Thin-Film Transistor Application   [ 154 K ]
  Authors: Joong Hyun Park, Do Young Kim, Jae Kyung Ko, Junsin Yi
• p19 Poly-Si Thin-Film Transistors Robust Against Hot-Carrier Stress and Application to Liquid Crystal Displays Fabricated by a 450°C Process   [ 480 K ]
  Authors: Takeo Shiba, Mutsuko Hatano, Mieko Matsumura, Yoshiaki Toyota, Yoshiharu Tai, Makoto Ohkura, Toshio Miyazawa, Toshihiko Itoga
• p31 Hot Carrier Effect in Low-Temperature Poly-Silicon p-Channel Thin-Film Transistors   [ 306 K ]
  Authors: H. Nakagawa, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki, Y. Morita
• p37 Polycrystalline Silicon Thin-Film Transistors Fabricated by Defect Reduction Methods   [ 305 K ]
  Authors: H. Watakabe, Mayumi Suzuki, Toshiyuki Sameshima
• p43 Reliability of Low-Temperature Poly-Si Thin-Film Transistors   [ 212 K ]
  Authors: Y. Inoue, H. Ogawa, Takeshi Endo, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki
• p49 Defect Control Process Technologies for High-Performance Polycrystalline Si Thin-Film Transistor Fabrication   [ 271 K ]
  Authors: Seiichiro Higashi, Daisuke Abe, Yasushi Hiroshima, Kazuyuki Miyashita, Takahiro Kawamura, Satoshi Inoue, Tatsuya Shimoda
• p55 Polysilicon Thin-Film Transistors Based on Frequency Doubled cw-Nd: YVO₄ Laser Crystallized Silicon   [ 291 K ]
  Authors: A. Saboundji, J.F. Michaud, T. Mohammed-Brahim, F. Le Bihan, G. Andrä, J. Bergmann, Fritz Falk
• p61 High Quality Polycrystalline Silicon Thin Film Transistors Fabricated from Laser-Irradiated Sputtered Si Films   [ 248 K ]
  Authors: Tadashi Serikawa
• p67 Behavior of Polysilicon Thin-Film Transistors at Different Temperatures   [ 311 K ]
  Authors: J.F. Llibre, H. Toutah, B. Tala-Ighil, B. Boudart, T. Mohammed-Brahim, O. Bonnaud
• p73 Gate-Insulator Film Deposition by Remote Plasma Chemical Vapour Deposition for Low-Temperature Poly-Si Thin-Film Transistors   [ 212 K ]
  Authors: Yasuaki Murata, Masataka Itoh, Shinji Morozumi
• p79 Analytical Current-Voltage Model for Polycrystalline Silicon Thin-Film Transistors   [ 75 K ]
  Authors: Mutsumi Kimura, Teruo Takizawa, Mitsutoshi Miyasaka, Satoshi Inoue, Tatsuya Shimoda
• p87 Very Thin Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical Vapour Deposition for Photovoltaic Applications   [ 826 K ]
  Authors: Urban Weber, Chandrachur Mukherjee, Markus Kupich, Bernd Schröder
• p99 Low-Temperature Formation of Polycrystalline Silicon and Its Device Application   [ 673 K ]
  Authors: H. Fujiwara, Y. Nasuno, Michio Kondo, Akihisa Matsuda
• p109 High-Density Microwave Plasma-Enhanced Chemical Vapor Deposition of Crystalline Silicon Films for Solar Cell Devices   [ 317 K ]
  Authors: Hajime Shirai, Go Ohkawara, Masanobu Nakajima