Paper Title:
High-Density Microwave Plasma-Enhanced Chemical Vapor Deposition of Crystalline Silicon Films for Solar Cell Devices
  Abstract

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Periodical
Solid State Phenomena (Volume 93)
Edited by
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages
109-114
DOI
10.4028/www.scientific.net/SSP.93.109
Citation
H. Shirai, G. Ohkawara, M. Nakajima, "High-Density Microwave Plasma-Enhanced Chemical Vapor Deposition of Crystalline Silicon Films for Solar Cell Devices ", Solid State Phenomena, Vol. 93, pp. 109-114, 2003
Online since
June 2003
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