High-Density Microwave Plasma-Enhanced Chemical Vapor Deposition of Crystalline Silicon Films for Solar Cell Devices |
| Journal |
Solid State Phenomena (Volume 93) |
| Volume |
Polycrystalline Semiconductors VII |
| Edited by |
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner |
| Pages |
109-114 |
| DOI |
10.4028/www.scientific.net/SSP.93.109 |
| Citation |
Hajime Shirai et al., 2003, Solid State Phenomena, 93, 109 |
| Authors |
Hajime Shirai, Go Ohkawara, Masanobu Nakajima |
| Keywords |
High Rate Deposition, Microcrystalline Silicon, Microwave Plasma, Solar Cell |
| Full Paper |
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