Paper Title:
Low-Temperature Formation of Si-Nanocrystal Dots from Chlorinated Materials by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition and Optical Properties
  Abstract

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Periodical
Solid State Phenomena (Volume 93)
Edited by
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages
275-280
DOI
10.4028/www.scientific.net/SSP.93.275
Citation
H. Shirai, T. Tsukamoto, K. Kurosaki, "Low-Temperature Formation of Si-Nanocrystal Dots from Chlorinated Materials by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition and Optical Properties ", Solid State Phenomena, Vol. 93, pp. 275-280, 2003
Online since
June 2003
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Price
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