Paper Title:
Deposition and Characterization of Polycrystalline Silicon Thin-Films by Reactive Thermal Chemical Vapour Deposition at 450°C
  Abstract

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Periodical
Solid State Phenomena (Volume 93)
Edited by
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages
281-286
DOI
10.4028/www.scientific.net/SSP.93.281
Citation
J.W. Lee, K. Shimizu, J. Hanna, "Deposition and Characterization of Polycrystalline Silicon Thin-Films by Reactive Thermal Chemical Vapour Deposition at 450°C ", Solid State Phenomena, Vol. 93, pp. 281-286, 2003
Online since
June 2003
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Price
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