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Reliability of Low-Temperature Poly-Si Thin-Film Transistors

Journal Solid State Phenomena (Volume 93)
Volume Polycrystalline Semiconductors VII
Edited by T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages 43-48
DOI 10.4028/www.scientific.net/SSP.93.43
Authors Y. Inoue, H. Ogawa, Takeshi Endo, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki
Keywords Drain Avalanche, Dynamic Stress, Hot Carriers, Reliability, Thin Film Transistor
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