Paper Title:
Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 93)
Edited by
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages
453-458
DOI
10.4028/www.scientific.net/SSP.93.453
Citation
H. Mahfoz-Kotb, A.C. Salaün, T. Mohammed-Brahim, F. Bendriaa, F. Le Bihan, O. Bonnaud, "Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems", Solid State Phenomena, Vol. 93, pp. 453-458, 2003
Online since
June 2003
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Price
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