Paper Title:
Gate-Insulator Film Deposition by Remote Plasma Chemical Vapour Deposition for Low-Temperature Poly-Si Thin-Film Transistors
  Abstract

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Periodical
Solid State Phenomena (Volume 93)
Edited by
T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner
Pages
73-78
DOI
10.4028/www.scientific.net/SSP.93.73
Citation
Y. Murata, M. Itoh, S. Morozumi, "Gate-Insulator Film Deposition by Remote Plasma Chemical Vapour Deposition for Low-Temperature Poly-Si Thin-Film Transistors", Solid State Phenomena, Vol. 93, pp. 73-78, 2003
Online since
June 2003
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