Paper Title:
Properties of Cavities Induced by Helium Implantation in Silicon and their Applications to Devices
  Abstract

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Periodical
Solid State Phenomena (Volumes 95-96)
Edited by
H. Richter and M. Kittler
Pages
297-306
DOI
10.4028/www.scientific.net/SSP.95-96.297
Citation
F. Cayrel, D. Alquier, L. Ventura, M. L. Vincent, F. Roqueta, C. Dubois, R. Jérisian, "Properties of Cavities Induced by Helium Implantation in Silicon and their Applications to Devices", Solid State Phenomena, Vols. 95-96, pp. 297-306, 2004
Online since
September 2003
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