Paper Title:
Gettering of Oxygen onto Buried Defect Layer in Hydrogen Implanted Silicon Wafers after Low Temperature Surface Saturation by Oxygen and Vacuum Annealing
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Periodical
Solid State Phenomena (Volumes 95-96)
Edited by
H. Richter and M. Kittler
Pages
571-576
DOI
10.4028/www.scientific.net/SSP.95-96.571
Citation
A.V. Frantskevich, A. M. Saad, A.V. Mazanik, A.K. Fedotov, E.I. Rau, S.V. Chigir, "Gettering of Oxygen onto Buried Defect Layer in Hydrogen Implanted Silicon Wafers after Low Temperature Surface Saturation by Oxygen and Vacuum Annealing", Solid State Phenomena, Vols. 95-96, pp. 571-576, 2004
Online since
September 2003
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