Local Dielectric Degradation of Cu-Contaminated SiO2 Thin Films |
| Journal |
Solid State Phenomena (Volumes 95 - 96) |
| Volume |
Gettering and Defect Engineering in Semiconductor Technology X |
| Edited by |
H. Richter and M. Kittler |
| Pages |
641-646 |
| DOI |
10.4028/www.scientific.net/SSP.95-96.641 |
| Citation |
Norio Tokuda et al., 2003, Solid State Phenomena, 95-96, 641 |
| Authors |
Norio Tokuda, Shingo Nishiguchi, Satoshi Yamasaki, Kazushi Miki, Kikuo Yamabe |
| Keywords |
Contamination, Copper (Cu), Dielectric Breakdown, Leakage Current, Silicon, Silicon Dioxide |
| Full Paper |
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