Paper Title:
Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer
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Periodical
Solid State Phenomena (Volumes 95-96)
Edited by
H. Richter and M. Kittler
Pages
653-658
DOI
10.4028/www.scientific.net/SSP.95-96.653
Citation
D. Wolfframm, S. Kouteva-Arguirova, T. Arguirov, R.P. Schmid, K. Dittmar, I. Zienert, J. Reif, "Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer", Solid State Phenomena, Vols. 95-96, pp. 653-658, 2004
Online since
September 2003
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