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Optimized Parameters for Modeling Oxygen Nucleation in Silicon

Journal Solid State Phenomena (Volumes 95 - 96)
Volume Gettering and Defect Engineering in Semiconductor Technology X
Edited by H. Richter and M. Kittler
Pages 71-76
DOI 10.4028/www.scientific.net/SSP.95-96.71
Authors Markus Zschorsch, Robert Hölzl, Herbert Rüfer, Hans Joachim Möller, Wilfried von Ammon
Keywords Computer Modeling, Gettering, Nucleation, Oxygen Precipitation, Silicon, Taguchi
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