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Gettering and Defect Engineering in Semiconductor Technology X

Solid State Phenomena Volumes 95 - 96

• Papers
• Abstracts

• p635 Self-Assembled Surface Patterning and Structural Modification upon Femtosecond Laser Processing of Crystalline Silicon   [ 843 K ]
  Authors: Florenta Costache, Simona Kouteva-Arguirova, Jürgen Reif
• p641 Local Dielectric Degradation of Cu-Contaminated SiO₂ Thin Films   [ 436 K ]
  Authors: Norio Tokuda, Shingo Nishiguchi, Satoshi Yamasaki, Kazushi Miki, Kikuo Yamabe
• p647 Process-Induced Changes of the Properties of Silicon Oxide Layers Containing Carbon: A Study of a Low-k Material to be Used in the Interconnection System   [ 51 K ]
  Authors: V.D. Akhmetov, Martin Kittler, Winfried Seifert, S. Marschmeyer, Hans Richter, Peter Formanek, J. Doerschel
• p653 Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer   [ 291 K ]
  Authors: Dirk Wolfframm, Simona Kouteva-Arguirova, Tzanimir Arguirov, R.P. Schmid, K. Dittmar, I Zienert, Jürgen Reif
• p659 Surface Tension Variation of Silicon Melts with Nitrogen Addition   [ 243 K ]
  Authors: Kazutaka Terashima, Mitsuyoshi Sakairi, Muneyuki Hirai, Tomohisa Tsuchiya
• p665 Prospects for New Wafer Types and Materials in Semiconductor Technology and Factors for their Successful Introduction   [ 727 K ]
  Authors: Werner Bergholz, Jürgen Wittmann, Rainer Winkler, Helmut Tews, Roger Fehlhaber