Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching |
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| Journal | Solid State Phenomena (Volumes 99 - 100) |
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| Volume | Functional Nanomaterials for Optoelectronics and other Applications |
| Edited by | Witold Lojkowski and John R. Blizzard |
| Pages | 83-88 |
| DOI | 10.4028/www.scientific.net/SSP.99-100.83 |
| Citation | E. Papis et al., 2004, Solid State Phenomena, 99-100, 83 |
| Authors | E. Papis, Anna Piotrowska, T.T. Piotrowski, K. Gołaszewska, L. Ilka, R. Kruszka, Jacek Ratajczak, J. Kątcki, J. Wróbel, M. Aleszkiewicz, R. Łukaskiewicz |
| Keywords | GaSb, Microlenses, Reactive Ion Etching, Sputter Etching |
| Abstract | Fabrication of surface-relief microstructures in GaSb for application in mid-infrared optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 µm and circular gratings with 0.4 µm linewidth / 1 µm period and 1.7 µm depth have been demonstrated. |
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