Paper Title:
Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching
  Abstract

Fabrication of surface-relief microstructures in GaSb for application in mid-infrared optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 µm and circular gratings with 0.4 µm linewidth / 1 µm period and 1.7 µm depth have been demonstrated.

  Info
Periodical
Solid State Phenomena (Volumes 99-100)
Edited by
Witold Lojkowski and John R. Blizzard
Pages
83-88
DOI
10.4028/www.scientific.net/SSP.99-100.83
Citation
E. Papis, A. Piotrowska, T.T. Piotrowski, K. Gołaszewska, L. Ilka, R. Kruszka, J. Ratajczak, J. Kątcki, J. Wróbel, M. Aleszkiewicz, R. Łukaskiewicz, "Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching", Solid State Phenomena, Vols. 99-100, pp. 83-88, 2004
Online since
July 2004
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$32.00
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