Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching |
| Journal |
Solid State Phenomena (Volumes 99 - 100) |
| Volume |
Functional Nanomaterials for Optoelectronics and other Applications |
| Edited by |
Witold Lojkowski and John R. Blizzard |
| Pages |
83-88 |
| DOI |
10.4028/www.scientific.net/SSP.99-100.83 |
| Authors |
E. Papis,
Anna Piotrowska,
T.T. Piotrowski,
K. Gołaszewska,
L. Ilka,
R. Kruszka,
Jacek Ratajczak,
J. Kątcki,
J. Wróbel,
M. Aleszkiewicz,
R. Łukaskiewicz
|
| Keywords |
GaSb, Microlenses, Reactive Ion Etching, Sputter Etching |
| Abstract |
Fabrication of surface-relief microstructures in GaSb for application in mid-infrared
optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 µm and circular gratings with 0.4 µm linewidth / 1 µm period and 1.7 µm depth have been demonstrated. |
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