Papers by keyword «Surface Roughness»
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AFM Study of In Situ Etching of 4H and 6H SiC Substrates
Authors: S. Karlsson, Nils Nordell
Keywords: Atomic Force Microscopy (AFM), Epitaxy, Etching, Surface Preparation, Surface Roughness
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Influence of Lubrication on Aluminum Superplastic Forming
Authors: K. Osada, K. Shirakawa
Keywords: AA5083, Boron Nitride, Graphite, Pressure, Scratch, Surface Roughness
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Analysis of Reflectivity Measurements for GaN Films Grown on GaAs: Influence of Surface Roughness and Interface Layers
Authors: S. Shokhovets, R. Goldhahn, Volker Cimalla, T.S. Cheng, C.T. Foxon
Keywords: GaAs Substrate, Interface Layer, Reflectivity, Refractive Index, Surface Roughness
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Microscopic Observation of Plastic Deformation of Polycrystalline Iron
Authors: Paul Clauws, Shigeki Okada, Ichiro Shimizu, Satoshi Tomosada, Eiji Ilzuka, Takashi Kobayashi
Keywords: Large Grain Size, Plasticity, Polycrystalline Metals, Ridging, Surface Roughness, Three Dimensional Surface Shape
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A Parametric Analysis of Surface Quality in Diamond Turning of an Al6061/SiCp Metal Matrix Composite
Authors: K.C. Chan, M.V. Ramesh, Wing Bun Lee, Chi Fai Cheung
Keywords: Metal Matrix Composite (MMC), Single-Point Diamond Turning, Surface Roughness
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Tailoring of Interface Mechanical Properties in Al2O3 Fiber-Reinforced Al2O3 Matrix Composite
Authors: Hideki Kakisawa, Yutaka Kagawa
Keywords: All Oxide Composite, Control of Interface Mechanical Properties, Frictional Sliding, Fugitive Coating, Polycrystalline Matrix, Surface Roughness
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Morphology Control for Growth of Thick Epitaxial 4H SiC Layers
Authors: Jie Zhang, Alexsandre Ellison, Erik Janzén
Keywords: Chimney CVD, Morphology, SiC Epitaxy, Step Bunching, Surface Roughness
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Polishing and Surface Characterization of SiC Substrates
Authors: W.J. Everson, David W. Snyder, V.D. Heydemann
Keywords: Annealing, CMP, KOH Etching, Polishing, Substrate Flatness, Surface Roughness
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Reactive Ion Etching in CF4 / O2 Gas Mixtures for Fabricating SiC Devices
Authors: Masayuki Imaizumi, Yoichiro Tarui, Hiroshi Sugimoto, J. Tanimura, Tetsuya Takami, Tatsuo Ozeki
Keywords: Accumulation Mode, MOSFET, Reactive Ion Etching, RIE Rate, Surface Roughness, X-Ray Photoelectron Spectroscopy (XPS)
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Radiative Recombination in InGaN/GaN Multiple Quantum Wells
Authors: J.Peder Bergman, Bo Monemar, G.R. Pozina, B.E. Sernelius, P.O. Holtz, Hiroshi Amano, Isamu Akasaki
Keywords: InGaN MQW, Photoluminescence (PL), Surface Roughness, Time-Resolved
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