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Articles by author: Bernd O. Kolbesen

• Application of HPLC for the Analysis of Organic Additives in Cleaning Chemicals and Cleaning Mixtures
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p221)
• Application of UV/VIS-Spectroscopy for Determination of Complexing Agent Stability in APM and Like Mixtures Thereof
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p55)
• Barium, Strontium and Bismuth Contamination in CMOS Processes
  Published in: Ultra Clean Processing of Silicon Surfaces V (p9)
• Complexing Agents Employed in Single Chemistry Cleaning: Stability Studies Using HPLC
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p37)
• Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects
  Published in: Ultra Clean Processing of Silicon Surfaces V (p1)
• Delineation of Microdefects in Silicon Substrates by Chromium-Free Preferential Etching Solutions and Laser Scattering Tomography
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIII (p443)
• Formation of Time-Dependent Haze on Silicon Wafers
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p109)
• Impact of Defects on the Technology of Highly Integrated Circuits
  Published in: Defects in Semiconductors 15 (p1)
• Metal Enhanced Oxidation of Silicon
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p245)
• Ozone Chemistry for BEOL Resist Stripping – A Systematic Analytical Attempt to Understand the Interaction of O₃ with Modern DUV-Resists
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p311)
• Peracetic Acid as Active Species in Mixtures for Selective Etching of SiGe/Si Layer Systems – Aspects of Chemistry and Analytics
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p79)
• Preparation and Characterization of Self-Assembled Monolayers on Germanium Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p169)
• Preparation and Characterization of Time Dependent Haze on Silicon Surfaces
  Published in: Ultra Clean Processing of Silicon Surfaces V (p115)
• Process-Induced Defects in Silicon Technology
  Published in: Gettering and Defect Engineering in Semiconductor Technology (p231)
• Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p119)