Papers by Author: Chih Yuan Lu

Abstract: In dual gate process, wet strip is an important procedure to remove the photoresist. Two wet strip methods of spinning-dry and batch type were evaluated in this study. Several methods were applied to measure the surface charging density [1, 2]. The Quantox system has been well known as an inline tester with noncontact measurement such as surface voltage, surface photo voltage (SPV), flatband voltage, surface barrier high, minority carrier diffusion length, recombination life time, generation life time, and et. al [3-6]. It is an useful in-line monitor equipment for oxide quality evaluation.

Abstract: The present study aims at polysilicon material fill-in at re-entrant profile at flash memory product. The void was observed after polysilicon fill-in. In order to prevent the void formation, the multi-step process of deposition wet-etching deposition (DWD) method was evaluated. The DWD method is found to play beneficial roles in achieving void-free in the floating gate. The high concentration of NH₄OH in APM was choosing for wet etching solution. Scanned electron microscopy (SEM) and transmission electron microscopy (TEM) were employed to measure the polysilicon thickness and cross-section profile of device.