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Articles by author: D. Martin Knotter

• A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p165)
• Hydrogen Peroxide Decomposition in Ammonia Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p15)
• Impact of Metal-Ion Contaminated Silica Particles on Gate Oxide Integrity
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p131)
• In Situ Particle Removal Studies Using an Optical Particle Counter
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p189)
• Local Distribution of Particles Deposited on Patterned Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p65)
• Ozone-Gas Concentration Measurements for Photoresist Stripping
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p223)
• Particle Deposition Studies in Acidic Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces V (p255)
• Reduced Particle Removal Efficiency Upon Wafer Storage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p61)
• Selective Si₃N₄ Etch in Single Wafer Application
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p103)
• Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p93)