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Articles by author: Erika Röhr

• A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p225)
• Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p237)
• Evaluation of a Dry Laser Cleaning Process for the Removal of Surface Particles
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p187)
• Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p85)
• Pre-Diffusion Cleaning Using Ozone and HF
  Published in: Ultra Clean Processing of Silicon Surfaces V (p85)
• Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p233)
• Surface Characterization after Different Wet Chemical Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p67)
• The Origins of Fluorine in Dry Ultrathin Silicon Oxides
  Published in: Ultra Clean Processing of Silicon Surfaces V (p153)