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Articles by author: F. Priolo

• Effect of Self-Interstitials – Nanovoids Interaction on Two-Dimensional Diffusion and Activation of Implanted B in Si
  Published in: Gettering and Defect Engineering in Semiconductor Technology XI (p395)
• Electroluminescence of Si Quantum Dots in MOS Structures
  Published in: Gettering anf Defect Engineering in Semiconductor Technology IX (p601)
• Influence of the Dislocation Loops on the Anomalous Diffusion of Fe Implanted into InP
  Published in: Defects in Semiconductors 19 (p1807)
• Interaction and Migration Properties of Ion Beam Induced Point Defects in Crystalline Silicon: Basic Research and Technological Relevance
  Published in: Diffusion in Silicon (p137)
• Interstitial Diffusion Influence upon Two-Dimensional Boron Profiles
  Published in: Gettering anf Defect Engineering in Semiconductor Technology IX (p183)
• Luminescence from Si Nanocrystals and Er³⁺ Ions Embedded in Resonant Cavities
  Published in: Gettering anf Defect Engineering in Semiconductor Technology IX (p617)
• Luminescence Properties of a Multi-Component Glass Co-Implanted with Si and Er
  Published in: Functional Nanomaterials for Optoelectronics and other Applications (p37)
• Suppression of Boron Transient Enhanced Diffusion by C Trapping
  Published in: Gettering anf Defect Engineering in Semiconductor Technology IX (p195)
• Two Dimensional Interstitial Diffusion in Mesoscopic Structures
  Published in: Gettering and Defect Engineering in Semiconductor Technology X (p351)