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Articles by author: Guy Vereecke

• A Force Study in Brush Scrubbing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p279)
• Aging Phenomena in the Removal of Nano-Particles from Si Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
• Effect of Transient pH on Particle Deposition during Immersion Rinsing
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p139)
• Evaluation of a Dry Laser Cleaning Process for the Removal of Surface Particles
  Published in: Ultra Clean Processing of Silicon Surfaces (p187)
• Evaluation of Megasonic Cleaning for Sub-90nm Technologies
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p141)
• Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p147)
• Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p143)
• Megasonics: A Cavitation Driven Process
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p159)
• Modification of Low-K SiCOH Film Porosity by a HF Solution
  Published in: Ultra Clean Processing of Silicon Surfaces (p135)
• Modification of Photoresist by UV for Post-Etch Wet Strip Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p323)
• Performance of a Linear Single Wafer IPA Vapour Based Drying System
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p75)
• Photoresist Characterization and Wet Strip after Low-k Dry Etch
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p325)
• Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p161)
• Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p193)
• Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)