Authors: Jong Hwi Park, Tae Kyoung Yang, Il Soo Kim, Won Jae Lee, Im Gyu Yeo, Tai Hee Eun, Seung Seok Lee, Jang Yul Kim, Myoung Chul Chun
Abstract: The present research was focused to investigate various process parameters influenced on the large 4H-SiC crystal growth on a 6H-SiC seed by PVT method. The crucible diameter along horizontal axial direction and inserted graphite ring was modified to change the growth parameter like the temperature gradient. In the initial stage of growth, foreign polytypes such as 6H/4H were observed on 6H-SiC seed, indicating the growth temperature to be unstable on crystal surface. However, from the middle of growth step, 4H-SiC was successfully formed in the ingot with the modification of growth pressure and a SIMS analysis confirmed the high doping concentration in grown 4H-SiC crystal.
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Authors: Im Gyu Yeo, Tae Woo Lee, Jong Hwi Park, Woo Sung Yang, Heui Bum Ryu, Mi Seon Park, Il Soo Kim, Byoung Chul Shin, Won Jae Lee, Tai Hee Eun, Seung Seok Lee, Myong Chuel Chun
Abstract: The single crystal ingots by using a sublimation technique were grown on 6H-SiC dual-seed crystals with opposite face polarities and then SiC crystal wafers sliced from the SiC ingot were systematically investigated to find out the polarity dependence of the crystal quality. The growth rate of the SiC crystal grown in this study was about 0.2mm/hr. N-type 2’’ SiC crystals exhibiting the 4H- and 6H-SiC polytype were successfully fabricated on C-face and Si-face, respectively. The incorporation of nitrogen donors in the SiC crystals grown on the C-face seed crystal was exhibited to be higher than in SiC crystals grown on a Si-face crystal. When the SiC crystal ingot proceeded to grow, the SiC crystal region grown on the C-face seed crystal was enlarged compared to the SiC crystal region on the Si-face seed crystal.
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Authors: Im Gyu Yeo, Tae Woo Lee, Jong Hwi Park, Woo Sung Yang, Heui Bum Ryu, Mi Seon Park, Il Soo Kim, Byoung Chul Shin, Won Jae Lee, Tai Hee Eun, Seung Seok Lee, Myong Chuel Chun
Abstract: Extensive study of various process parameters to influence on the growth of 4H-SiC crystal has been carried out using the transformation of the 6H-SiC seed by a PVT method. The axial temperature gradients were increased throughout increasing the crucible length along growth direction in order to enhance the growth rate and transformed crystal yield. The N2/Ar gas ratio used during the crystal growth related with carrier concentration/mobility of grown crystal. In the initial stage of growth, foreign polytypes such as 6H/15R were observed on 6H-SiC seed crystal but 4H crystals were entirely grown after the process optimization. While the typical absorption spectrum of SiC seed crystal indicated that the SiC polytype was the 6H-SiC with fundamental absorption energy of about 3.02eV, absorption spectrum of grown SiC crystal exhibited 4H-SiC with fundamental absorption energy of about 3.26eV. The entirely transformed SiC region exhibited lower micropipe density than 6H/4H transition region.
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Authors: Im Gyu Yeo, Tae Woo Lee, Won Jae Lee, Byoung Chul Shin, Il Soo Kim, Jung Woo Choi, Kap Ryeol Ku, Young Hee Kim, Shigehiro Nishino
Abstract: The present research was focused to produce 2 inch wafers from small rectangular seeds and to investigate the quality of non-polar SiC substrates grown by a conventional PVT method. The non-polar SiC seeds were prepared by cutting along <0001> direction of 6H-SiC crystal grown on (0001) basal plane. As SiC ingot grows, many defects in connected region were gradually diminished. While the full width at half maximum (FWHM) values of m-plane SiC substrate measured along a-direction and c-direction were 60 arcsec and 70 arcsec, respectively, and the FWHM values of a-plane SiC substrate measured along m-direction and c-direction were 27 arcsec and 31 arcsec respectively. The stacking faults lying in the basal plane can be detected by molten KOH etching as linear etch pits extending along <0001> on the (11-20) surface and the carrier concentration was observed by Raman spectrum.
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Authors: Hyun Hee Hwang, Jung Kyu Kim, Jong Mun Choi, Won Jae Lee, Il Soo Kim, Byoung Chul Shin, Hae Yong Lee
Abstract: GaN epitaxial layers were grown on sapphire substrate deposited an aluminum (Al) buffer layer using a hydride vapor phase epitaxy (HVPE) system with a two-zone resistance furnace. A 10nm-thick Al buffer layer was prepared by an e-beam evaporation in order to reduce the stress resulted from thermal mismatch between the GaN layer and the substrate. The growth temperature and growth rate for GaN epitaxial layer were 1050oC and 40 m/hr, respectively. GaN epitaxial layer grown on substrate with Al buffer layer exhibited uniform and smooth morphology on 2-inch whole substrate and a bow value of 33.5 m. The addition of Al-buffer layer apparently reduced the full width at half maximum (FWHM) value of GaN layer, which indicated the improvement of crystal quality.
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Authors: Jung Woo Choi, Chang Hyun Son, Jong Mun Choi, Gi Sub Lee, Won Jae Lee, Il Soo Kim, Byoung Chul Shin, Kap Ryeol Ku
Abstract: Two SiC single crystal ingots were prepared using sublimation PVT techniques through the different process procedure and then their crystal quality was systematically compared, because the present research was focused to improve the quality of SiC crystal by modifying the initial stage of the PVT growth. Before the main growth step for growing SiC bulk crystal, initial stage period where growth rate was kept to relatively low rate of <10μm/h was introduced to conventional process procedure. N-type 2”-SiC single crystals exhibiting the polytype of 6H-SiC was successfully fabricated. As compared to the characteristics of SiC crystal grown using the conventional schedule, the quality of SiC crystal grown with modifying the initial stage was significantly improved, exhibiting decrease of defect formation such as micropipe and polytype formation.
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Authors: Jung Gon Kim, Joon Ho An, Jung Doo Seo, Jung Kyu Kim, Myung Ok Kyun, Won Jae Lee, Il Soo Kim, Byoung Chul Shin, Kap Ryeol Ku
Abstract: We investigated the effects of hydrogen addition to the growth process of SiC single crystal
using sublimation physical vapor transport (PVT) techniques. Hydrogen was periodically added to an
inert gas for the growth ambient during the SiC bulk growth. Grown 2”-SiC single crystals were
proven to be the polytype of 6H-SiC and carrier concentration levels of about 1017/cm3 was
determined from Hall measurements. As compared to the characteristics of SiC crystal grown without
using hydrogen addition, the SiC crystal grown with periodically modulated hydrogen addition
definitely exhibited lower carrier concentration and lower micropipe density as well as reduced
growth rate.
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Authors: Jung Doo Seo, Joon Ho An, Jung Gon Kim, Jung Kyu Kim, Myung Ok Kyun, Won Jae Lee, Il Soo Kim, Byoung Chul Shin, Kap Ryeol Ku
Abstract: SiC single crystal ingots were prepared onto different seed material using sublimation PVT
techniques and then their crystal quality was systematically compared. In this study, the conventional
SiC seed material and the new SiC seed material with an inserted SiC epitaxial layer on a seed surface
were used as a seed for SiC bulk growth. The inserted epitaxial layer was grown by a sublimation
epitaxy method called the CST with a low growth rate of 2μm/h. N-type 2”-SiC single crystals
exhibiting the polytype of 6H-SiC were successfully fabricated and carrier concentration levels of
below 1017/cm3 were determined from the absorption spectrum and Hall measurements. The slightly
higher growth rate and carrier concentration were obtained in SiC single crystal ingot grown on new
SiC seed materials with the inserted epitaxial layer on the seed surface, maintaining the high quality.
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Authors: Kap Ryeol Ku, Jung Kyu Kim, Jung Doo Seo, Ju Young Lee, Myung Ok Kyun, Won Jae Lee, Geun Hyoung Lee, Il Soo Kim, Byoung Chul Shin
Abstract: SiC single crystal ingots grown by sublimation physical vapor transport (PVT) technique
were prepared and then the SiC crystal quality with varying crucible design employing a guide tube
and tantalum foil was systematically investigated. The growth rate of 2-inch SiC crystal grown by
these crucible designs was about 0.3 mm/hr. The n-type and p-type 2”-SiC single crystals exhibiting
the polytype of 6H-SiC were successfully fabricated. The doping concentration level of below
~1017/cm3 was extracted from the absorption spectrum and Hall measurement. The densities of
micropipes and inclusions in SiC crystal boules grown using the graphite/Ta foil double layer guide
tube were significantly decreased. Finally we improved crystal quality through the introduction of
new crucible design.
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Authors: Jung Kyu Kim, Kap Ryeol Ku, Dong Jin Kim, Sang Phil Kim, Won Jae Lee, Byoung Chul Shin, Geun Hyoung Lee, Il Soo Kim
Abstract: SiC crystal boules with different shapes were prepared using sublimation physical vapor transport technique (PVT) and then their crystal quality was systematically investigated. The temperature distribution in the growth system and the crystal shape were controlled by modification of crucible and insulation felt design, which was successfully simulated using “Virtual Reactor” for flat structure design and concave structure design. The SiC polytype proved to be the n-type 6H-SiC
from the typical absorption spectrum of SiC crystal. The defect density of SiC crystal boules with concave structure was slightly lower than that of flat structure and the crystal quality of SiC crystal boules with both flat structure and concave structure was significantly improved as the SiC crystal grows during the PVT methods.
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