Papers by Author: Ivan Blum

Abstract: The Diffusion and Solubility of B Implanted in δ-Ni₂Si and Nisi Layers Is Studied by SIMS. it Is Observed that both Diffusion and Solubility Are Higher in δ-Ni₂Si than Nisi. the Redistribution of B during Ni Silicidation Is Also Studied. the SIMS Profiles Show the Presence of Concentration Step in the Middle of the Final Nisi Layer. this Profile Shape Is Explained in Light of the Results Obtained in Preformed Silicides. the Proposed Model Is Supported by Redistribution Simulations that Can Reproduce the Main Features of the Profile.

Abstract: With the development of nanotechnologies, the number of industrial processes dealing with the production of nanostructures or nanoobjects is in constant progress (microelectronics, metallurgy). Thus, knowledge of atom mobility and the understanding of atom redistribution in nanoobjects and during their fabrication have become subjects of increasing importance, since they are key parameters to control nanofabrication. Especially, todays materials can be both composed of nanoobjects as clusters or decorated defects, and contain a large number of interfaces as in nanometer-thick film stacking and buried nanowires or nanoislands. Atom redistribution in this type of materials is quite complex due to the combination of different effects, such as composition and stress, and is still not very well known due to experimental issues. For example, it has been shown that atomic transport in nanocrystalline layers can be several orders of magnitude faster than in microcrystalline layers, though the reason for this mobility increase is still under debate. Effective diffusion in nanocrystalline layers is expected to be highly dependent on interface and grain boundary (GB) diffusion, as well as triple junction diffusion. However, experimental measurements of diffusion coefficients in nanograins, nanograin boundaries, triple junctions, and interfaces, as well as investigations concerning diffusion mechanisms, and defect formation and mobility in these different diffusion paths are today still needed, in order to give a complete picture of nanodiffusion and nanosize effects upon atom transport. In this paper, we present recent studies dealing with diffusion in nanocrystalline materials using original simulations combined with usual 1D composition profile measurements, or using the particular abilities of atom probe tomography (APT) to experimentally characterize interfaces. We present techniques allowing for the simultaneous measurement of grain and GB diffusion coefficients in polycrystals, as well as the measurement of nanograin lattice diffusion and triple junction diffusion. We also show that laser-assisted APT microscopy is the ideal tool to study interface diffusion and nanodiffusion in nanostructures, since it allows the determination of 1D, 2D and 3D atomic distributions that can be analyzed using diffusion analytical solutions or numerical simulation.

Abstract: The phase formation sequence of Ni silicide for different thicknesses is studied by in situ X ray diffraction and differential scanning calorimetry measurements. The formation of a transient phase is observed during the formation of δ-Ni₂Si; transient phases grow and disappear during the growth of another phase. A possible mechanism is proposed for the transient phase formation and consumption. It is applied to the growth and consumption of θ-Ni₂Si. A good accordance is found between the proposed model and in situ measurement of the kinetics of phase formation obtained by x-ray diffraction and differential scanning calorimetry for higher thickness.

Abstract: The measurement of diffusion coefficients in today’s materials is complicated by the down scaling of the studied structures (nanometric effects in thin films, nano-crystalline layers, etc.) and by the complex production process conditions of industrial samples or structures (temperature variations, complex solute and point defect distributions, stress gradients, etc.). Often diffusion measurements have to be performed in samples for which initial experimental conditions do not offer the possibility of using conventional diffusion analytical solutions. Furthermore, phenomena involved with diffusion are sometimes so numerous and complex (stress, matrix composition inhomogeneities, time dependence of point defect generation sources, electrical effects, clustering effects, etc…) that the use of analytical solutions to solve the observed diffusion behavior is difficult. However, simulations can be of use in these cases. They are time consuming compared to the use of analytical solutions, but are more flexible regarding initial conditions and problem complexity. The use of simulations in order to model physical phenomena is quite common nowadays, and highly complex models have been developed. However, two types of simulations have to be considered: i) simulations aiming to understand and predict phenomena, and ii) simulations for measurement purposes, aiming to extract the (average) value of a physical parameter from experimental data. These two cases have different constrains. In the second case, that is the subject of this article, one of the most important stress is that the simulation has to precisely scale the experiment (sample size, experiment duration, etc.), sometimes preventing the measurement due to computational time consumption. Furthermore, the simpler the model (small number of parameters) used in the simulation, the more relevant the measurement (minimum error). In this paper, examples of recent works using two- and three-dimensional finite element simulations for diffusion coefficient measurements in thin polycrystalline films and nano-crystalline layers are presented. The possible use of simulations for diffusion coefficient measurements considering GB migration, GB segregation, or triple junctions is also discussed.

Abstract: A method is presented to measure lattice and grain boundary diffusion coefficients using secondary ion mass spectroscopy and 2-dimensional diffusion simulations. SIMS is used to measure concentration profiles of implanted species before and after annealing. The as-implanted concentration profile is used as the initial condition for 2-dimensional diffusion simulations using the finite element method. The geometry of the simulation is based on the microstructure of the sample observed by transmission electron microscopy. Both lattice and grain boundary diffusion are simulated. The final 2-dimensional concentration distribution is projected on the depth axis to obtain a simulated depth profile. The diffusion coefficients are adjusted to fit the profiles measured after annealing. We find that this method allows to determine simultaneously and independently the lattice and grain boundary diffusion coefficients from the same profiles. This method is used to measure the diffusion coefficients of As in polycrystalline Ni2Si thin films. The simulations are found to fit the measured profiles with accuracy. The coefficients are measured between 550 and 700°C. An activation energy ratio Qgb/Qv is found greater than one. This result is corroborated by existing data in silicides and is compared to results in other materials for discussion.