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Papers by Author: K.V. Ravi

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Application of Gate Oxide Integrity to the Evaluation of the Efficiency of Internal and External Gettering Sites in Si Wafers

Authors: Sergei V. Koveshnikov, David Beauchaine, Zbigniew J. Radzimski, Li Ling, K.V. Ravi

393

Materials Quality and Materials Cost - Are they on a Collision Course?

Authors: K.V. Ravi

103