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Articles by author: Kurt Wostyn

• Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p55)
• Cleaning Requirement in the Thinning Module for 3D-Stacked IC (3D-SIC) Integration
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p265)
• Effects of Interfacial Strength and Dimension of Structures on Physical Cleaning Window
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p123)
• High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p7)
• High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p39)
• Pattern Collapse and Particle Removal Forces of Interest to Semiconductor Fabrication Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p47)
• Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p31)
• Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p193)
• Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p233)
• Surface Passivation for Si Solar Cells: A Combination of Advanced Surface Cleaning and Thermal Atomic Layer Deposition of Al₂O₃
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p357)
• The Influence of Standing Waves on Cleaning with a Megasonic Nozzle
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p23)
• The Removal of Silica Particles from Micron Wide Trenches by Megasonic Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p221)