Papers by Author: M.C. Pérez

Abstract: Research on the effect of ion implantation on the corrosion behaviour of metals has been carried out for years, but some difficulties arise in the comparison of the obtained results due to variations in experimental conditions (alloys, surface preparation, doses, experimental techniques...). This work tries to overcome those differences, presenting the effect of several elements (Ce+, N+, Cr+ and Cr+ N+) implanted in similar conditions on the pitting corrosion resistance of AISI 430 stainless steel. Potentiodynamic measurements in 1M NaCl demonstrate the beneficial effect of all the implanted elements, showing that Ce+ is the less efficient ion, while Cr+ N+ co-implantation gives the best results in terms of localized attack resistance. Pitting morphology is explained in terms of the XPS and GIXRD data that allow chemical and structural characterization of the implanted layer. Those results help to enlighten the protection mechanisms involved in the considered implantations.

Abstract: Two austenitic stainless steels have been implanted at 150 keV with Mo at a fluence of 3.5x1015 ions/cm2. The effects of ion implantation in the chemical composition of the passive films was evaluated by x-ray photoelectron spectroscopy (XPS) and glancing angle x-ray diffraction (GAXRD) was used to determine the induced structural modifications. The results of the pitting corrosion studies carried out in neutral chloride medium as well as the morphology of the localized attack are discussed.

Abstract: Surface analysis techniques (XPS and grazing incidence X-ray diffraction GIXRD) and electrochemical techniques have been combined to elucidate the effect resulting from Cr+ and N+ co-implantation in the formation and evolution of passive layers generated on two different stainless steels (AISI 430 and AISI 304L) in alkaline medium. The results show that the nitrides formed on AISI 430, identified as (Cr,Fe)2N1-x, are less resistant to dissolution while the nitride phase formed in AISI 304L, NCr with nanocrystalline structure, allows the compact growth of the oxide film.